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From: john larkin <jl@glen--canyon.com>
Newsgroups: sci.electronics.design
Subject: Re: Revolution in chip manufacturing!!
Date: Tue, 31 Dec 2024 14:02:58 -0800
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On Tue, 31 Dec 2024 21:39:30 -0000 (UTC), Phil Hobbs
<pcdhSpamMeSenseless@electrooptical.net> wrote:

>john larkin <jl@glen--canyon.com> wrote:
>> On Tue, 31 Dec 2024 05:51:39 GMT, Jan Panteltje <alien@comet.invalid>
>> wrote:
>> 
>>> Engineering researchers develop deep-UV microLED display chips for maskless
>>> photolithography
>>> https://www.sciencedaily.com/releases/2024/12/241230131942.htm
>>> Source:
>>> Hong Kong University of Science and Technology
>>> Summary:
>>> In a breakthrough set to revolutionize the semiconductor industry,
>>> engineers have developed the world's first-of-its-kind deep-ultraviolet
>>> (UVC) microLED display array for lithography machines.
>>> This enhanced efficiency UVC microLED has showcased the viability of a
>>> lowered cost maskless photolithography
>>> through the provision of adequate light output power density, enabling
>>> exposure of photoresist films in a shorter time.
>>> 
>>> High-Power AlGaN Deep-Ultraviolet Micro-Light-Emitting Diode Displays
>>> for Maskless Photolithography
>>> Now everybody and their cat cam make nano nano chips?
>>> End of ASML?
>>> Go short on them?
>>> 
>>> 
>> 
>> There's another outfit that is serious about going after ASML. 
>> 
>> https://www.xlight.com/
>> 
>> The idea is to make a rather large electron accelerator and use that
>> to build an EUV free-electron laser.
>> 
>> That's all I can say.
>> 
>> 
>
>Resin-based 3D printing does amazingly well with bog standard 4k LCDs and
>UV LEDs, achieving 20 micron voxel size. Simon uses it for his
>automatically generated cradles for test jigs.  
>
>I’m a fan.
>
>Chip litho has been better than that since the dawn of the planar process.
>You can easily do 5 microns with contact printing, even if you’re a bit
>cross-eyed. 
>
>A lot of the advances in lithography technology are based on using the very
>high contrast of photo resist to multiply resolution. 
>
>You expose using a dose that just exceeds the resist threshold to make a
>grid of narrow lines spaced by a bit more than half a wavelength. (Details
>vary depending on the numerical aperture and refractive index.)
>
>Then you develop the resist, forming the narrow lines. Repeat once for 2x
>resolution, or three times for 4x. 
>
>Once you have this grating structure, you have to cut the lines in
>appropriate places to form the actual circuit outline. This is harder. 
>
>Also, of course you have to lay out your circuit so that this highly
>restricted geometry can build it. Not too easy, but that’s how chips have
>been made for many years now. 
>
>All of which is very fiddly.  
>
>State of the art litho is already using multiple exposures of 13.5 nm
>light. That’s a photon energy of 92 eV, which dwarfs the band gap of any
>material whatsoever. (Diamond is the champ at 5.5 eV.)
>
>Thus there’s no way to make a LED with a wavelength that short. 
>
>A super high density array of super small 200-nm LEDs could be pretty
>useful if it wasn’t too expensive, but you ain’t doing maskless litho at
>advanced nodes with that. 
>
>There’s a _lot_ of money spent on litho R&D, 
>So perhaps there’s a way to do it using an array of LEDs and multiple
>exposures, at least at nodes where 200 nm lithography still works. 
>
>Not going to replace advanced light sources and wafer scanners anytime
>soon, and anyway the extreme-precision motion and positioning will still be
>needed.  
>
>Might be great for making semi-custom chips based on arrays of gates or
>transistors.
>
>Cheers 
>
>Phil Hobbs 

I think that some of the first ICs were silk screened.

It should be possible to inkjet some power mosfets or something.