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From: Bill Sloman <bill.sloman@ieee.org>
Newsgroups: sci.electronics.design
Subject: Linear accelerator as an EUV soruce for semi-conductor lithography
Date: Sat, 12 Oct 2024 00:47:42 +1100
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I came across this in IEEE Spectrum

https://spectrum.ieee.org/euv-fel

Phil Hobbs got the ASML tin-droplet EUV light source to work, but there 
now seems to be the prospect of better way to do it, with undulators 
acting on high energy electron beam as the EUV source.

It has always been a fairly obvious idea, but - as the Spectrum article 
makes clear - it's not easy to get enough EUV light out.

-- 

Bill Sloman, Sydney